Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs)

Stoian, Marius; Lazar, Liliana; Uny, Florent; Sanchette, Frederic; Fechete, Ioana

Marius Stoian, Liliana Lazar, Florent Uny, Frederic Sanchette, Ioana Fechete

Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs)

Abstract:

Chemical vapour deposition (CVD) is an important technique that uses volatile precursors to produce thin film deposits on an exposed substrate, having the capability to generate different types of nanostructures (e.g. nanoparticles, nanotubes, nanofibers or nanocomposites) as catalytic materials. The environmental hazard of volatile organic compounds (VOCs) requires efficient methods to reduce their emission into the atmosphere, due to their high potential to cause severe health issues, along with their extended spread in the environment. Catalytic combustion proves to be one of the most effective means for the abatement of VOCs, employing different catalysts, such as noble metals or non-noble metal oxides, to facilitate the oxidation process of the pollutants. These catalysts can be prepared through various methods as multiple steps wet processes or CVD techniques, indicating the superiority of the CVD-prepared catalysts compared to those prepared using the former type of process, due to the ability to achieve high dispersion of the active material, together with enhanced textural and morphological properties. This paper aims to present the various CVD techniques employed in the fabrication of different catalysts with the possibility of generating materials at nano-scale for use in numerous reactions, mostly in combustion process for VOCs decomposition.

Keywords:
CVD; VOCs; thin film; total oxidation; CH4

Issue: 2020, Volume 71, Issue 7

Pages: 97-113

Publication date: 2020/8/4

https://doi.org/10.37358/RC.20.7.8229

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This article is published under the Creative Commons Attribution 4.0 International License

Citation Styles

Cite this article as:
STOIAN, M., LAZAR, L., UNY, F., SANCHETTE, F., FECHETE, I., Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs), Rev. Chim., 71(7), 2020, 97-113.

Vancouver
Stoian M, Lazar L, Uny F, Sanchette F, Fechete I. Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs). Rev. Chim.[internet]. 2020 Jul;71(7):97-113. Available from: https://doi.org/10.37358/RC.20.7.8229

APA 6th edition
Stoian, M., Lazar, L., Uny, F., Sanchette, F. & Fechete, I. (2020). Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs). Revista de Chimie, 71(7), 97-113. https://doi.org/10.37358/RC.20.7.8229

Harvard
Stoian, M., Lazar, L., Uny, F., Sanchette, F., Fechete, I. (2020). 'Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs)', Revista de Chimie, 71(7), pp. 97-113. https://doi.org/10.37358/RC.20.7.8229

IEEE
M. Stoian, L. Lazar, F. Uny, F. Sanchette, I. Fechete, "Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs)". Revista de Chimie, vol. 71, no. 7, pp. 97-113, 2020. [online]. https://doi.org/10.37358/RC.20.7.8229

Text
Marius Stoian, Liliana Lazar, Florent Uny, Frederic Sanchette, Ioana Fechete,
Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs),
Revista de Chimie,
Volume 71, Issue 7,
2020,
Pages 97-113,
ISSN 2668-8212,
https://doi.org/10.37358/RC.20.7.8229.
(https://revistadechimie.ro/Articles.asp?ID=8229)
Keywords: CVD; VOCs; thin film; total oxidation; CH4

RIS
TY - JOUR
T1 - Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs)
A1 - Stoian, Marius
A2 - Lazar, Liliana
A3 - Uny, Florent
A4 - Sanchette, Frederic
A5 - Fechete, Ioana
JF - Revista de Chimie
JO - Rev. Chim.
PB - Revista de Chimie SRL
SN - 2668-8212
Y1 - 2020
VL - 71
IS - 7
SP - 97
EP - 113
UR - https://doi.org/10.37358/RC.20.7.8229
KW - CVD
KW - VOCs
KW - thin film
KW - total oxidation
KW - CH4
ER -

BibTex
@article{RevCh2020P97,
author = {Stoian Marius and Lazar Liliana and Uny Florent and Sanchette Frederic and Fechete Ioana},
title = {Chemical Vapour Deposition (CVD) Technique for Abatement of Volatile Organic Compounds (VOCs)},
journal = {Revista de Chimie},
volume = {71},
number = {7},
pages = {97-113},
year = {2020},
issn = {2668-8212},
doi = {https://doi.org/10.37358/RC.20.7.8229},
url = {https://revistadechimie.ro/Articles.asp?ID=8229}
}

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